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Nishikino, Masaharu; Ishino, Masahiko; Ichimaru, Satoshi*; Hatayama, Masatoshi*; Hasegawa, Noboru; Kawachi, Tetsuya
Reza Gakkai Dai-483-Kai Kenkyukai Hokoku; Tanhacho Ryoshi Bimu Hassei To Sono Oyo, p.25 - 28, 2015/12
X-ray ablation has been recently achieved using plasma soft X-ray lasers (SXRLs), laser plasma soft X-rays, and X-ray free electron lasers. In order to study the interactions between picosecond SXRL beams and material and multi-layered structure surfaces were irradiated with SXRL pulse. Following irradiation, the substrate surface was observed using a scanning electron microscope and an atomic force microscope. The surface modifications caused by the SXRL beam were clearly seen. The multi-layered mirror is the important component for the EUV lithography. Then, we have started the damage test of multi-layered structure, and the surface modifications caused by the SXRL pulse irradiations were confirmed.